Designer Mateusz Pukło

Designer Mateusz Pukło, photographed by Piotr Serafin @serafinphotography Makeup Hair by Magdalena Nosal

Models Adam Wilk Kamil Tomczak Maciej Pawłowski Radek Hliniak  at A S Management Warsaw

Retouch by Maria Bieluszko, assistance by Beata Pizło Piotr Pizło, Anna Godlewska




Mateusz Puklo is a clothing brand for a man inspired by the classics and minimalism. The brand offers a product made of high-quality materials such as wool of merino, wool with cashmere, cotton or natural leather.

Its main idea is to personalize male classic and to present it in a new form. Currently, it is focused on developing professional tailoring and creating woman line in the next collection.

Dark Line Collection

The collection is an original interpretation of the menswear’s classic. It is based on the inspiration of line’s shape and use of different fabrics with textural black color. Was presented twice, during Cracow Fashion Awards 2016 and Fashion Philosophy Fashion Week Poland.

At the beginning, there was a passion for fashion. Designing came later.

An application to School of Fashion Design in Krakow was one of the most important steps in my life and that decision changed everything. Most of my spare time I needed to spent on painting and sketching for school. Taking it all together my lost couple years were focused mostly on personal and artistic development.

As the school gone by my aesthetics was evolving and the biggest experience for me was making the final diploma menswear collection. I graduated with top grades and right after my diploma show I participated in the biggest fashion event in Poland, Fashion Philosophy Fashion Week Poland in Łódź.

Right now I am focused on the promotion of the Dark Line; collection, I cooperate with many stylists, fashion photographers , nd magazines. I contracted a professional sewing company to meet the needs of boutiques that want to sell my products. I am also launching the online shop. Meanwhileam working on my next collection, both for women and men which I should be able to present next spring.

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